Phosphoric acid

1. Pharmaceutical and food grade phosphoric acid technical data: 

H3PO4SPECIFICATION
ColorTransparent colorless or light color
ConditionSticky fluid
Content as H3PO4, w/%            ≥85.0/80.0/75.0
Fluoride as F ppm                 ≤10
Reductive matter as H3PO3%,w/%   ≤0.012
Arsenic as As: ppm                  ≤0.5
Heavy metal as Pb: ppm            ≤5.0

Application: used as an acidifier, chelating agent, yeast nutrient, pH regulator for brewing, and also in the production of food grade phosphates. Pharmaceutical additives (solvents), dental adhesives, and can also be used as analytical reagents.

2. Industry grade phosphoric acid technical data: 

H3PO4SPECIFICATION
IIIIII
AppearanceTransparent colorless sticky fluid
Color  ≤20≤30≤40
Content as H3PO4%    85.0/ 80.0/ 75.0
Chloride as Cl%      ≤0.0005≤0.0005≤0.0005
Sulphate as SO4%       ≤0.003≤0.005≤0.01
Heavy metal as Pb%   ≤0.001≤0.001≤0.005
Arsenic as As%        ≤0.0001≤0.005≤0.01
Iron as Fe%     ≤0.002≤0.002≤0.005

Application: used in electroplating,phosphating liquid and industrial phosphate production

3. LCD grade phosphoric acid technical data: 

H3PO4SPECIFICATION
Colority/Hazen                                                  ≤ 5
Content  as H3PO4,w/%                                   ≥ 85
Specific  gravity(20℃/20℃)1.691~1.710
Water-insoluble  matters/ppm                         ≤ 50
Volatile  acid as CH3COOH/ppm                    ≤ 10
Reductive  matter as H3PO3/ ppm                  ≤ 80
Heavy  metals as Pb / ppm                            ≤ 4
Fluoride  as F / ppm                                     ≤ 10
Nitric  as NO3 / ppm                                      ≤ 5
Sulfates  as SO4 / ppm                                     ≤ 10
Chloride  as Cl / ppm                                        ≤ 1
Arsenic(As)/ppb                                          ≤ 500
Iron(Fe)/ppb                                                ≤ 500
Sodium  (Na) /ppb                                           ≤ 500
Calcium  (Ca) /ppb                                          ≤ 500
Lead  (Pb) /ppb                                                ≤ 500
Manganese  (Mn) /ppb                                   ≤ 500
Nickel  (Ni) /ppb                                               ≤ 500
Copper  (Cu) /ppb                                           ≤ 500
Chromium(Cr)/ppb                                     ≤ 500
Aluminum(Al)/ppb                                      ≤ 500
Bismuth(Bi)/ppb                                           ≤ 500
Cobalt  (Co) /ppb                                              ≤ 500
Potassium  (K) /ppb                                         ≤ 500
Lithium  (Li) /ppb                                             ≤ 500
Magnesium  (Mg) /ppb                                   ≤ 500
Strontium  (Sr) /ppb                                         ≤ 500
Zinc(Zn)/ppb                                                ≤ 500
Antimony(Sb)/ppb                                     ≤ 3000

Application: used in LCD screen surface glass treatment and cleaning agent

4. IC grade phosphoric acid technical data:

H3PO4SPECIFICATION
E1E2E3/E4
AppearanceClear,colourless,  viscous liquid
H3PO4      85%(%)85~8785~8785~87
H3PO3 % ≤0.005≤0.001≤0.001
NO3- ppm≤5≤0.5≤0.5
SO42-ppm≤10≤5≤5
Cl- ppm≤1≤0.5≤0.2
Al ppb   ≤200≤50
B  ppb             ≤50
Sb  ppb  ≤3000≤300
As   ppb    ≤100≤20
Ba   ppb ≤100≤20
Cd   ppb ≤100≤20
Ca  ppb         ≤1000≤50
Cr   ppb      ≤100≤20
Co  ppb          10020
Cu   ppb       ≤50≤20
Ga   ppb            ≤100≤10
Au  ppb            ≤100≤10
Fe  ppb           ≤300≤50
Pb  ppb         ≤100≤20
Li  ppb      ≤100≤10
Mg  ppb          ≤100≤20
Mn  ppb              ≤100≤20
Ni  ppb              ≤100≤20
K   ppb             ≤100≤20
Ag  ppb            ≤100≤20
Na  ppb  ≤              ≤500≤50
Sn   ppb  ≤             ≤—≤10
Sr  ppb  ≤             ≤100≤20
Ti  ppb  ≤             ≤100≤50
Zn  ppb  ≤            ≤100≤50
particle(μm,pcs/mL)As per customer’s request

Application:

used as cleaning agent and etching agent for semiconductor separation devices

used in large-scale integrated circuits: 

  1. Cleaning before gluing the substrate
  2. Etching and final degumming inphotolithography
  3. Cleaning inthe silicon wafer process and insulating film etching, semiconductor film etching, conductor film etching, organic material etching,etc.